موصلات النانو

The importance of nanowires fabrication is that it is not only can be used to fabricate nanodevices such as transistors or to produce magnetic memories that has high capacities (Ouyang, 2004), but also can be used as interconnections between components. Continuing scaling down and shrinking feature size of devices by 12-14 % a year, according to Moore's law, will lead to devices in the atomic scale with new properties and principles (Massimiliano Di Ventran and et al, 2004). ). There are many different techniques that can be used to fabricate nanowires. Electron beam lithography is the most commonly used technique to create nanostructure with a high degree of control. Intel Corporation is developing extreme-Ultraviolet (EUV) lithography with 13.5 nm wavelength for making the future microprocessors. This method is expected to permit one to print circuit and wires with figure sizes as tiny as 30 nm and below, which is beyond the capability of the optical lithography. We are trying to participate on modifying new generation of technologies and develop a new infrastructure and method using conducting polymer as a nanowire. In order to study the nanowire's electrical properties, suitable microelectrodes must be fabricated first with certain resistance, size and shape. These electrodes should have the ability to carry out the electrical connection between the nanowire and the probe station For more information about nanotechnology please visit the website below;

http://www.ncl.ac.uk/nanolab/tutorials/whatis.htm